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Proceedings Paper

Plume reflection in pulsed laser deposition
Author(s): Aurelian Marcu; Constantin Grigoriu; Weihua Jiang; Kiyoshi Yatsui
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Paper Abstract

Plume reflection has been studied as a possibility for depositing on a direction perpendicular to target, convenient for manipulation of big size substrates and for avoiding the presence of droplets on film surface. Plume behaviour during reflection on a 45 degree(s) oriented plane surface has been monitored by a high- speed camera. Thin film, deposited by reflected plume, has been analysed by scanning electron microscopy (SEM) and atomic forces microscopy (AFM). Comparing with a standard deposition a 1-2 order of magnitude improvement for film roughness (RMS) has been noticed at the expense of one order of magnitude diminuation of deposition rate. The results have shown significant dependencies of film thickness and surface quality on plume reflection angle. Some aspects of big particles movement in deposition process are also presented.

Paper Details

Date Published: 9 August 2002
PDF: 5 pages
Proc. SPIE 4762, ALT'01 International Conference on Advanced Laser Technologies, (9 August 2002); doi: 10.1117/12.478638
Show Author Affiliations
Aurelian Marcu, National Institute for Laser, Plasma, and Radiation Physics (Romania)
Constantin Grigoriu, National Institute for Laser, Plasma, and Radiation Physics (Romania)
Weihua Jiang, Nagaoka Univ. of Technology (Japan)
Kiyoshi Yatsui, Nagaoka Univ. of Technology (Japan)

Published in SPIE Proceedings Vol. 4762:
ALT'01 International Conference on Advanced Laser Technologies
Dan C. Dumitras; Maria Dinescu; Vitali I. Konov, Editor(s)

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