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Proceedings Paper

Design rules for the fabrication of binary half-tone masks used for MEMS and photonic devices
Author(s): Peter D. Rhyins; Christopher J. Progler; Glenn S Claydon; Ernest W Balch
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Paper Abstract

Gray scale lithography is becoming a popular technique for producing three-dimensional structures needed in fabricating photonics and MEMS devices. The structures are printed using a variable transmission mask to yield the required continuous tone intensity during image formation. In binary half tone imaging (i.e., BHT), the transmission through the mask is adjusted by varying the open area of sub-patterns. Design rules, fabrication tradeoffs and a layout methodology employing a novel primitive cell to aid in constructing the BHT masks are discussed Simulation is leveraged to tie the BHT design with expected imaging results. The overall process is exercised by fabricating a specific grayscale design for use in a photonic application. The BHT mask approach to gray scale lithography is a viable method to fabricate three-dimensional images offering MEMS and photonics communities a cost effective alternative to gray scale masks which rely on specialty materials and films.

Paper Details

Date Published: 15 January 2003
PDF: 16 pages
Proc. SPIE 4979, Micromachining and Microfabrication Process Technology VIII, (15 January 2003); doi: 10.1117/12.478283
Show Author Affiliations
Peter D. Rhyins, Photronics Inc. (United States)
Christopher J. Progler, Photronics Inc. (United States)
Glenn S Claydon, General Electric Co. (United States)
Ernest W Balch, General Electric Co. (United States)

Published in SPIE Proceedings Vol. 4979:
Micromachining and Microfabrication Process Technology VIII
John A. Yasaitis; Mary Ann Perez-Maher; Jean Michel Karam, Editor(s)

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