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Proceedings Paper

Performance enhancement and evaluation of deep dry etching on a production cluster platform
Author(s): Mark E. McNie; Christopher Pickering; Alexandra L. Rickard; Iain M. Young; Janet Hopkins; Huma Ashraf; Serrita A. McAuley; Glenn Nicholls; Richard Barnett; Fred Roozeboom; Anton Kemmeren; Eric Van Den Heuvel; Jan T. Verhoeven; Colin Gormley; Paulo Schina; Corrado Di Luciano; Jyrki Kiihamaki
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Paper Abstract

Over the last 5 years, deep dry etching of silicon has developed into a mainstream microsystems process technology. To transition from R&D into production, some of the main issues to address are the CoO (cost of ownership), reliability and reproducibility of capital equipment. Commensurate with this, it is essential to achieve high etch rates with good profile control. MICROSPECT (Microsystems Production Evaluated Cluster Tool), a project within the EC SEA programme, has sought to address these issues. The project has evaluated and significantly enhanced the performance of STS ASE modules for deep dry etching on an ASPECTHR production cluster platform. The development phase of the project has provided an ideal opportunity for the equipment supplier to test and respond to feedback on the tool and the latest hardware and software developments with multiple end users, including a new high density inductively coupled plasma (ICP) source. This has resulted in higher etch rates for greater throughput and improved profile control across a variety of applications, including silicon-on-insulator (SOI)-based MEMS and microfluidics. During the evaluation phase, the system was operated under close-to-production conditions to establish system reliability and metrics.

Paper Details

Date Published: 15 January 2003
PDF: 9 pages
Proc. SPIE 4979, Micromachining and Microfabrication Process Technology VIII, (15 January 2003); doi: 10.1117/12.478242
Show Author Affiliations
Mark E. McNie, QinetiQ (United Kingdom)
Christopher Pickering, QinetiQ (United Kingdom)
Alexandra L. Rickard, QinetiQ (United Kingdom)
Iain M. Young, QinetiQ (United Kingdom)
Janet Hopkins, Surface Technology Systems Ltd. (United Kingdom)
Huma Ashraf, Surface Technology Systems Ltd. (United Kingdom)
Serrita A. McAuley, Surface Technology Systems Ltd. (United Kingdom)
Glenn Nicholls, Surface Technology Systems Ltd. (United Kingdom)
Richard Barnett, Surface Technology Systems Ltd. (United Kingdom)
Fred Roozeboom, Philips Research Labs. (Netherlands)
Anton Kemmeren, Philips Research Labs. (Netherlands)
Eric Van Den Heuvel, Philips Research Labs. (Netherlands)
Jan T. Verhoeven, Philips Research Labs. (Netherlands)
Colin Gormley, Analog Devices, Inc. (United Kingdom)
Paulo Schina, Olivetti I-Jet S.p.A. (Italy)
Corrado Di Luciano, Olivetti I-Jet S.p.A. (Italy)
Jyrki Kiihamaki, VTT Information Technology (Finland)

Published in SPIE Proceedings Vol. 4979:
Micromachining and Microfabrication Process Technology VIII
John A. Yasaitis; Mary Ann Perez-Maher; Jean Michel Karam, Editor(s)

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