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Proceedings Paper

Novel fabrication methods for 2D photonic crystals in silicon slab waveguides
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Paper Abstract

In this paper we present the development of several new and novel fabrication methods for the realization of two-dimensional photonic crystal devices in silicon slab waveguides. We begin by presenting a process for the fabrication of high fill-factor devices in silicon-on-insulator wafers. Next, we present a grayscale fabrication process for the realization of three-dimensional silicon structures, such as tapered horn couplers. We then present the fabrication of suspended silicon slabs using a co-polymer process based on direct write electron beam lithography and silicon sputtering. And lastly, we conclude by presenting an alternate method for realizing PhC devices in a silicon slab based on a combination of wet and dry etching processes in bulk silicon wafers.

Paper Details

Date Published: 17 January 2003
PDF: 11 pages
Proc. SPIE 4984, Micromachining Technology for Micro-Optics and Nano-Optics, (17 January 2003); doi: 10.1117/12.477850
Show Author Affiliations
Dennis W. Prather, Univ. of Delaware (United States)
Janusz A. Murakowski, Univ. of Delaware (United States)
Sriram Venkataraman, Univ. of Delaware (United States)
Yao Peng, Univ. of Delaware (United States)
Anita Balcha, Univ. of Delaware (United States)
Thomas Dillon, Univ. of Delaware (United States)
David Pustai, Univ. of Delaware (United States)

Published in SPIE Proceedings Vol. 4984:
Micromachining Technology for Micro-Optics and Nano-Optics
Eric G. Johnson, Editor(s)

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