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Proceedings Paper

Operation of spatial light modulators in DUV light
Author(s): Ulrike Dauderstaedt; Peter Duerr; Mathias Krellmann; Tord Karlin; Uldis Berzinsh; Lars Leonardsson; Horst Wendrock
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Paper Abstract

The Fraunhofer Institute for Microelectronic Circuits and Systems (FhG-IMS) has developed spatial light modulators (SLM), which are used in a pattern generator for DUV laser mask writing developed by Micronic Laser Systems. They consist of micromirror arrays and allow massive parallel writing in UV mask writers. The chip discussed here consists of 2048 × 512 individually addressable mirrors and can be run at a frame rate of 1 to 2 kHz. For this application it is necessary that the SLMs can be operated under DUV light without changing their performance. This paper discusses a failure mechanism of the SLMs when operated in DUV light and countermeasures to eliminate this effect.

Paper Details

Date Published: 20 January 2003
PDF: 8 pages
Proc. SPIE 4985, MOEMS Display and Imaging Systems, (20 January 2003); doi: 10.1117/12.477805
Show Author Affiliations
Ulrike Dauderstaedt, Fraunhofer-Institut fuer Mikroelektronische Schaltungen und Systeme (Germany)
Peter Duerr, Fraunhofer-Institut fuer Mikroelektronische Schaltungen und Systeme (Germany)
Mathias Krellmann, Fraunhofer-Institut fuer Mikroelektronische Schaltungen und Systeme (Germany)
Tord Karlin, Micronic Laser Systems AB (Sweden)
Uldis Berzinsh, Micronic Laser Systems AB (Sweden)
Lars Leonardsson, Micronic Laser Systems AB (Sweden)
Horst Wendrock, Leibniz-Institut fuer Festkoerper- und Werkstoffforschung Dresden (Germany)

Published in SPIE Proceedings Vol. 4985:
MOEMS Display and Imaging Systems
Hakan Urey, Editor(s)

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