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Proceedings Paper

Adjustment of optical proximity correction (OPC) software for mask process correction (MPC): Module 2. Lithography simulation based on optical mask writing tool simulation
Author(s): Alexandra Barberet; Peter D. Buck; Gilles L. Fanget; Olivier Toublan; Jean-Charles Richoilley; Michel Tissier
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Paper Abstract

We develop a Mask Process Correction (MPC) set of tools in collaboration with DuPont Photomasks, Mentor Graphics and CEA-LETI. The MPC project consists of 3 modules.

Paper Details

Date Published: 1 August 2002
PDF: 11 pages
Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); doi: 10.1117/12.476988
Show Author Affiliations
Alexandra Barberet, DuPont Photomasks (France)
Peter D. Buck, DuPont Photomasks, Inc. (United States)
Gilles L. Fanget, CEA-LETI (France)
Olivier Toublan, Mentor Graphics (France)
Jean-Charles Richoilley, DuPont Photomasks (France)
Michel Tissier, DuPont Photomasks (France)

Published in SPIE Proceedings Vol. 4754:
Photomask and Next-Generation Lithography Mask Technology IX
Hiroichi Kawahira, Editor(s)

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