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Proceedings Paper

Improvement of critical dimension stability of chemically amplified resist by overcoat
Author(s): Teruhiko Kumada; Atsuko Sasahara; Kazuyuki Maetoko; Kunihiro Hosono; Takemichi Honma; Yuji Kodaira; Yukio Nakashiba; Masaoshi Tsuzuki; Yasutaka Kikuchi
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Paper Abstract

The critical dimensions (CD) change by the process delay is the most critical issue to use the chemically amplified resists (CAR) for photomask fabrication. In the photo-mask fabrication processes, the resist should have both post coating delay (PCD) and post exposure delay (PED) stability, while keeping higher sensitivity. To achieve this requirement, overcoat process has been examined for the purpose of CD stabilization in CAR process for photomask manufacture. The material, which consists of hydrophobic polymer and photo acid generator (PAG), was used for the overcoat in this study. It has been proved that the overcoat shows the effect of controlling CD change, and applying the overcoat does not generate a fatal number of defects and pinholes. From these results, it is thought that the overcoat process is promising for the size stabilization in photomask manufacture for 100 nm devices.

Paper Details

Date Published: 1 August 2002
PDF: 8 pages
Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); doi: 10.1117/12.476955
Show Author Affiliations
Teruhiko Kumada, Mitsubishi Electric Corp. (Japan)
Atsuko Sasahara, Mitsubishi Electric Corp. (Japan)
Kazuyuki Maetoko, Mitsubishi Electric Corp. (Japan)
Kunihiro Hosono, Mitsubishi Electric Corp. (Japan)
Takemichi Honma, Toppan Printing Co., Inc. (Japan)
Yuji Kodaira, Toppan Printing Co., Inc. (Japan)
Yukio Nakashiba, Toppan Printing Co., Inc. (Japan)
Masaoshi Tsuzuki, Toppan Printing Co., Inc. (Japan)
Yasutaka Kikuchi, Toppan Printing Co., Inc. (Japan)

Published in SPIE Proceedings Vol. 4754:
Photomask and Next-Generation Lithography Mask Technology IX
Hiroichi Kawahira, Editor(s)

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