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Proceedings Paper

Phase assignment for bright field of dense contact
Author(s): Nail Tang
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Paper Abstract

There is a simple algorithm to translate the dense contacts of a regular design into a well assigned two phases in this paper. Some of its basic variant applications and a procedure to detect the phase assignment errors for the whole chip layer to insure the whole chip phase assignment success are also included. The variant applications include to add the assist features and assign the phases between the main features and the assist features and the post rule bias consideration. This executable environment makes the alternating PSM easy to be applied in the bright field of the dense contact.

Paper Details

Date Published: 1 August 2002
PDF: 8 pages
Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); doi: 10.1117/12.476940
Show Author Affiliations
Nail Tang, Mentor Graphics Taiwan Ltd. (Taiwan)

Published in SPIE Proceedings Vol. 4754:
Photomask and Next-Generation Lithography Mask Technology IX
Hiroichi Kawahira, Editor(s)

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