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Proceedings Paper

Advanced data preparation and design automation
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Paper Abstract

As new resolution enhancement techniques (RETs) are adopted to progress beyond 100 nm, the costs and benefits to the overall system of data handling must be viewed as an overall system. A 'state' approach to viewing flows has been very useful for determining insertion points for several RETs. Data preparation is a necessary part of the transformation from layout to mask. The data manipulations of required for RET also fall in this space between layout and mask. When separate point tools are used to carry out these different manipulations, increasingly large amounts of time are required to simply move data from one point tool to the other. As data file sizes increase as expected over the next decade, this problem will increase by orders of magnitude. None of this time is providing any additional productivity for data preparation. The result has been pressure to provide an integrated solution, in which OPC, phase assignment, and data preparation all share a single database. This delays flattening the data until the last necessary moment, presumably in the mask writer itself.

Paper Details

Date Published: 1 August 2002
PDF: 12 pages
Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); doi: 10.1117/12.476929
Show Author Affiliations
Franklin M. Schellenberg, Mentor Graphics Corp. (United States)

Published in SPIE Proceedings Vol. 4754:
Photomask and Next-Generation Lithography Mask Technology IX
Hiroichi Kawahira, Editor(s)

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