Share Email Print

Proceedings Paper

Process of manufacturing and inspection of high-end (ternary) tritone EAPSM reticles for 0.13um design rule generation
Author(s): Steve Tuan; Gidon Gottlib; Anja Rosenbusch
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

Embedded attenuated phase shift masks (EAPSMs) are being used in the semiconductor industry for high-density patterning of critical layers, such as gate and contact layers of circuit devices, of the 130 nm node and beyond. This paper focuses on the manufacturing and inspection of ternary (tritone) phase shift masks designed for the 130 nm design-rule generation. The manufacturing flow is presented and the use of the ARISTM100i mask inspection system for inspection is demonstrated.

Paper Details

Date Published: 1 August 2002
PDF: 6 pages
Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); doi: 10.1117/12.476924
Show Author Affiliations
Steve Tuan, Toppan Chunghwa Electronics Co., Ltd. (Taiwan)
Gidon Gottlib, Etec Systems (United States)
Anja Rosenbusch, Etec Systems (United States)

Published in SPIE Proceedings Vol. 4754:
Photomask and Next-Generation Lithography Mask Technology IX
Hiroichi Kawahira, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?