Proceedings Paper
Process of manufacturing and inspection of high-end (ternary) tritone EAPSM reticles for 0.13um design rule generation| Format | Member Price | Non-Member Price |
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Paper Abstract
Embedded attenuated phase shift masks (EAPSMs) are being used in the semiconductor industry for high-density patterning of critical layers, such as gate and contact layers of circuit devices, of the 130 nm node and beyond. This paper focuses on the manufacturing and inspection of ternary (tritone) phase shift masks designed for the 130 nm design-rule generation. The manufacturing flow is presented and the use of the ARISTM100i mask inspection system for inspection is demonstrated.
Paper Details
Date Published: 1 August 2002
PDF: 6 pages
Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); doi: 10.1117/12.476924
Published in SPIE Proceedings Vol. 4754:
Photomask and Next-Generation Lithography Mask Technology IX
Hiroichi Kawahira, Editor(s)
PDF: 6 pages
Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); doi: 10.1117/12.476924
Show Author Affiliations
Steve Tuan, Toppan Chunghwa Electronics Co., Ltd. (Taiwan)
Gidon Gottlib, Etec Systems (United States)
Gidon Gottlib, Etec Systems (United States)
Anja Rosenbusch, Etec Systems (United States)
Published in SPIE Proceedings Vol. 4754:
Photomask and Next-Generation Lithography Mask Technology IX
Hiroichi Kawahira, Editor(s)
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