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Proceedings Paper

Raster scan patterning solution for 100- and 70-nm OPC masks
Author(s): Frank E. Abboud; Ki-Ho Baik; Varoujan Chakarian; Damon M. Cole; Robert L. Dean; Mark A. Gesley; Herb Gillman; William C. Moore; Mark Mueller; Robert J. Naber; Thomas H. Newman; Romin Puri; Frederick Raymond III; Mario Rougieri
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Paper Abstract

Photomask complexity threatens to outpace mask pattern generator productivity, as semiconductor devices are scaled down and optical proximity correction (OPC) becomes commonplace. Raster scan architectures are well suited to the challenge of maintaining mask throughput and mask quality despite these trends. The MEBES eXara mask pattern generator combines the resolution of a finely focused 50 keV electron beam with the productivity and accuracy of Raster Graybeam writing. Features below 100 nm can be imaged, and OPC designs are produced with consistent fidelity. Write time is independent of resist sensitivity, allowing high-dose processes to be extended, and relaxing sensitivity constraints on chemically amplified resists. Data handling capability is enhanced by a new hierarchical front end and hiearchical data format, building on an underlying writing strategy that is efficient for OPC patterns. A large operating range enables the MEBES eXara system to support the production of 100 nm photomasks, and the development of 70 nm masks.

Paper Details

Date Published: 1 August 2002
PDF: 12 pages
Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); doi: 10.1117/12.476923
Show Author Affiliations
Frank E. Abboud, Etec Systems, Inc. (United States)
Ki-Ho Baik, Etec Systems, Inc. (United States)
Varoujan Chakarian, Etec Systems, Inc. (United States)
Damon M. Cole, Etec Systems, Inc. (United States)
Robert L. Dean, Etec Systems, Inc. (United States)
Mark A. Gesley, Etec Systems, Inc. (United States)
Herb Gillman, Etec Systems, Inc. (United States)
William C. Moore, Etec Systems, Inc. (United States)
Mark Mueller, Etec Systems, Inc. (United States)
Robert J. Naber, Etec Systems, Inc. (United States)
Thomas H. Newman, Etec Systems, Inc. (United States)
Romin Puri, Etec Systems, Inc. (United States)
Frederick Raymond III, Etec Systems, Inc. (United States)
Mario Rougieri, Etec Systems, Inc. (United States)

Published in SPIE Proceedings Vol. 4754:
Photomask and Next-Generation Lithography Mask Technology IX
Hiroichi Kawahira, Editor(s)

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