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Proceedings Paper

TiO2 waveguide with ZnO-ZnO:Al cladding for active optical subsystems
Author(s): Gerrit Schoer; Hans Joachim Heider; Stefan Wiechmann; Joerg Mueller
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Paper Abstract

In this paper a tunable optic system is presented for use in various optical systems. In contrast to most of the tunable optical components which are composed of a waveguide, an electro-optical layer, and electrodes of different materials. The new system consists of a TiO2 waveguide with ZnO as a functional layer on top. The TiO2 layer acts as a high index waveguide, the ZnO system consists of a ZnO:Al/ZnO/ZnO:Al sandwich structure. The ZnO film is used as an electro-optical cladding for the TiO2 waveguide while the two ZnO:Al films act as transparent electrodes. Applying a voltage results in a shift of the effective refractive index of the waveguide because of the electro-optical effect of the ZnO. The TiO2 film is deposited on SiO2 by a PECVD-process from a metal organic precursor CpTiCh (cyclopentadienyl-cycloheptatrienyl-titanium). ZnO and ZnO:Al are rf-sputtered from a Zn target and ZnO:Al target, respectively. While both ZnO layers are c-oriented polycrystals, the TiO2 grows in a nanocrystalline formation without any texture. The configuration of the high index material TiO2 in combination with the transparent and electro-optical ZnO layer allows the use in integrated optical subsystems such as active couplers or active micro ring resonators. The system is designed for a wavelength of 1550 nm.

Paper Details

Date Published: 9 July 2003
PDF: 9 pages
Proc. SPIE 4998, Photonic Integrated Systems, (9 July 2003); doi: 10.1117/12.475842
Show Author Affiliations
Gerrit Schoer, Technische Univ. Hamburg-Harburg (Germany)
Hans Joachim Heider, Technische Univ. Hamburg-Harburg (Germany)
Stefan Wiechmann, Technische Univ. Hamburg-Harburg (Germany)
Joerg Mueller, Technische Univ. Hamburg-Harburg (Germany)

Published in SPIE Proceedings Vol. 4998:
Photonic Integrated Systems
Andrew R. Pirich; Ray T. Chen; Louay A. Eldada; Louay A. Eldada; Andrew R. Pirich; Joseph C. Chon; Paul L. Repak; Paul L. Repak; Ray T. Chen; Joseph C. Chon, Editor(s)

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