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Proceedings Paper

Fluorinated polyimide film replicated using SiO2 mold for fabrication of waveguide
Author(s): Tsuyoshi Shioda
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Paper Abstract

A replication process using a SiO2 mold was demonstrated using a fluorinated polyimide. The replicated fluorinated polyimide film was separated from the mold by soaking in distilled water. The film separation with slow and then successive fast steps was due to the displacment of the weak adhesive layer by water and release of stress at the interface, respectively. Lowering the curing temperature of the fluorinated polyimide, whcih formed the weak adhesive layer at the interface, improved separation without chipping of the stripes of the SiO2 mold.

Paper Details

Date Published: 14 July 2003
PDF: 8 pages
Proc. SPIE 4991, Organic Photonic Materials and Devices V, (14 July 2003); doi: 10.1117/12.475450
Show Author Affiliations
Tsuyoshi Shioda, Mitsui Chemicals, Inc. (Japan)

Published in SPIE Proceedings Vol. 4991:
Organic Photonic Materials and Devices V
James G. Grote; Toshikuni Kaino, Editor(s)

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