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Proceedings Paper

Chemical-vapor-deposited silicon and silicon carbide optical substrates for severe environments
Author(s): Jitendra Singh Goela; Michael A. Pickering; Raymond L. Taylor
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Paper Abstract

In this paper properties of chemical vapor deposited (CVD) SiC and Si optical substrates for use in severe environments are presented. Important data on CVD SiC concerning the elastic modulus polishability scattering measurement thermal and cryogenic stability degradation due to atomic oxygen and electron beam are included. Further scattering measurement data and atomic oxygen degradation effects on CVD Si are also presented. These measurements show that CVD SiC substrates exhibit excellent polishability 1 A RMS) with low scatter good retention of mechanical properties up to 1500 C superior thermal and cryogenic stability (-190 C to 1350 C) and high resistance to atomic oxygen and electron beam degradation. VD Si substrates exhibit excellent polishability 2 A RNS) with low scatter and good resistance to atomic oxygen degradation. These preliminary results suggest that CVD SiC and Si are good optical substrates for severe environment such as outer space lasers combustion and synchrotron x-rays. 1 . 0

Paper Details

Date Published: 1 January 1991
PDF: 14 pages
Proc. SPIE 1330, Optical Surfaces Resistant to Severe Environments, (1 January 1991); doi: 10.1117/12.47515
Show Author Affiliations
Jitendra Singh Goela, Morton International/CVD Inc. (United States)
Michael A. Pickering, Morton International/CVD Inc. (United States)
Raymond L. Taylor, Morton International/CVD Inc. (United States)

Published in SPIE Proceedings Vol. 1330:
Optical Surfaces Resistant to Severe Environments
Solomon Musikant, Editor(s)

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