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Proceedings Paper

Improved adhesion of photoresist to III-V substrates using PECVD carbon films
Author(s): David P. Mancini; Steven M. Smith; Andrew F. Hooper; A. Talin; Daniel Chang; Douglas J. Resnick; Steven A. Voight
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Paper Abstract

Amorphous PECVD carbon films have been investigated as a means to prepare III-V compound semiconductor substrates for improved photoresist adhesion. Results show that significant improvements in adhesive durability of patterned photoresist occurred for carbon primed GaAs and InGaAs wafers used in conjunction with both i-line and DUV lithography processes. These carbon layers, were 50-100 Angstrom in thickness, and varied in composition and morphology from a nitrogen-doped, diamond-like material (DLC), to a more hydrogen rich, polymer-like material (PLC). Adhesion durability tests performed in baths of ammonium hydroxide (NH4OH) and hydrochloric acid (HCl) in general showed superior performance compared to non-primed substrates. The sole exception was a failure of PLC priming on GaAs wafers used with a DUV anti-reflective coating. This same system, however, was shown to work extremely well when a DLC coating was substituted. Characterization of PLC and DLC films included use of AES, XPS, FTIR, AFM, and contact angle analysis. Results indicate that carbon films passivate III-V oxides, creating a stable, hydrophobic surface. This factor is proposed as a key reason for the improved resistance to aggressive aqueous environments. AFM results show that carbon films are extremely smooth and actually decrease surface roughness, indicating that mechanical adhesion is unlikely.

Paper Details

Date Published: 30 July 2002
PDF: 11 pages
Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474642
Show Author Affiliations
David P. Mancini, Motorola (United States)
Steven M. Smith, Motorola (United States)
Andrew F. Hooper, Motorola (United States)
A. Talin, Motorola (United States)
Daniel Chang, Motorola (United States)
Douglas J. Resnick, Motorola (United States)
Steven A. Voight, Motorola (United States)

Published in SPIE Proceedings Vol. 4691:
Optical Microlithography XV
Anthony Yen, Editor(s)

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