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Proceedings Paper

Contamination and degradation of 157-nm stepper optical components: field experience at International SEMATECH
Author(s): Jeff Meute; Georgia K. Rich; Stefan Hien; Kim R. Dean; Carolyn Gondran; Julian S. Cashmore; Dominic Ashworth; James E. Webb; Lisa R. Rich; Paul G. Dewa
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Paper Abstract

Significant improvement in 157nm optical components lifetime is required for successful implementation of pilot and production scale 157nm lithography. To date, most of the 157nm optics lifetime data has been collected in controlled laboratory conditions by introducing predetermined concentrations of contaminants and monitoring degradation in terms of transmission loss. This publication compliments prior work by documenting field experience with the 157nm Exitech Microstepper currently in operation at International SEMATECH. Failure mechanisms of various optical components are presented and molecular contamination levels in purge gas, tool enclosure, and clean room are documented. Finally the impacts of contaminant deposition and degradation of components on imaging performance is discussed.

Paper Details

Date Published: 30 July 2002
PDF: 10 pages
Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474621
Show Author Affiliations
Jeff Meute, IBM Corp. (United States)
International SEMATECH (United States)
Georgia K. Rich, International SEMATECH (United States)
Stefan Hien, Infineon Tecnologies Corp. (United States)
International SEMATECH (United States)
Kim R. Dean, International SEMATECH (United States)
Carolyn Gondran, International SEMATECH (United States)
Julian S. Cashmore, Exitech Ltd. (United Kingdom)
Dominic Ashworth, Exitech Ltd. (United States)
James E. Webb, Corning Tropel Corp. (United States)
Lisa R. Rich, Corning Tropel Corp. (United States)
Paul G. Dewa, Corning Tropel Corp. (United States)

Published in SPIE Proceedings Vol. 4691:
Optical Microlithography XV
Anthony Yen, Editor(s)

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