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Proceedings Paper

Controlling CD variations in a massively parallel pattern generator
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Paper Abstract

Micronic is developing a massively parallel pattern generation system based on a micro-mechanical spatial light modulator (SLM). The electro-mechanical and optical properties of the micromirrors in the SLM can vary from one to another and over time. Therefore the response of each mirror must be calibrated, with accuracy sufficient to maintain CD uniformity requirements. We present a practical method for performing this calibration which greatly improves the micromirror grayscale uniformity and reduces CD error contribution from the SLM to less than 2nm.

Paper Details

Date Published: 30 July 2002
PDF: 8 pages
Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474615
Show Author Affiliations
Jarek Z. Luberek, Micronic Laser Systems AB (Sweden)
Allen M. Carroll, Micronic Laser Systems AB (Sweden)
Torbjoern Sandstrom, Micronic Laser Systems AB (Sweden)
Andrzej Karawajczyk, Micronic Laser Systems AB (Sweden)

Published in SPIE Proceedings Vol. 4691:
Optical Microlithography XV
Anthony Yen, Editor(s)

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