Share Email Print

Proceedings Paper

System qualification and optimization for imaging performance on the 0.80-NA 248-nm step-and-scan systems
Author(s): Koen van Ingen Schenau; Hans Bakker; Mark Zellenrath; Richard Moerman; Jeroen Linders; Thomas Rohe; Wolfgang Emer
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

This paper shows the improvements in imaging performance on the ASML PAS5500/800TM, the PAS5500/850BTM and the TWINSCANTM AT:850BTM Step & Scan systems. During setup, the lens aberrations are measured by the TAMIS technique and optimized. This gives excellent imaging performance for aberration sensitive features such as 'two bar,' the DRAM isolation pattern and isolated lines printed with alternating PSM. Lithographic tests based on these features were developed and tested on a number of 800 and 850 systems and gave results well within specification limits. Consequently, the imaging performance has been improved for a wide range of applications.

Paper Details

Date Published: 30 July 2002
PDF: 15 pages
Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474612
Show Author Affiliations
Koen van Ingen Schenau, ASML (Netherlands)
Hans Bakker, ASML (Netherlands)
Mark Zellenrath, ASML (Netherlands)
Richard Moerman, ASML (Netherlands)
Jeroen Linders, ASML (Netherlands)
Thomas Rohe, Carl Zeiss (Germany)
Wolfgang Emer, Carl Zeiss (Germany)

Published in SPIE Proceedings Vol. 4691:
Optical Microlithography XV
Anthony Yen, Editor(s)

© SPIE. Terms of Use
Back to Top