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Proceedings Paper

Performance enhancement of 157-nm Newtonian catadioptric objectives
Author(s): James E. Webb; Timothy Rich; Anthony R. Phillips; James D. Cornell
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Paper Abstract

Newtonian design forms have been developed to explore higher numerical aperture imaging systems at a wavelength of 157 nm with elements made of CaF2 crystal. First-generation systems working at 0.60 NA are currently printing features smaller than 130 nm for resist-process-development. Second-generation design forms, working with variable numerical apertures above 0.75 NA, will push feature sizes significantly below 100 nm. Several aspects of second-generation designs have been improved to accommodate the need for characterizing and enhancing imaging performance. Closed-loop methods of optimization to reduce aberrations have been developed to characterize and control the effects of crystal-related birefringence on imagery. In addition these systems are learning vehicles to enhance knowledge of aberration-image performance dependence at high numerical apertures.

Paper Details

Date Published: 30 July 2002
PDF: 11 pages
Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474611
Show Author Affiliations
James E. Webb, Corning Tropel Corp. (United States)
Timothy Rich, Corning Tropel Corp. (United States)
Anthony R. Phillips, Corning Tropel Corp. (United States)
James D. Cornell, Corning Tropel Corp. (United States)

Published in SPIE Proceedings Vol. 4691:
Optical Microlithography XV
Anthony Yen, Editor(s)

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