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Proceedings Paper

Behavior of candidate organic pellicle materials under 157-nm laser irradiation
Author(s): Andrew Grenville; Vladimir Liberman; Mordechai Rothschild; Jan H. C. Sedlacek; Roger H. French; Robert C. Wheland; Xun Zhang; Joe Gordan
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Paper Abstract

Transmission loss during irradiation remains the critical limitation for polymer pellicle materials at 157 nm. In this work we establish a framework for calculating the necessary pellicle lifetime as well as a test methodology for evaluating the laser durability of candidate polymer films. We examine the role of key extrinsic environmental variables in determining film lifetime. Oxygen concentration affects pellicle lifetime, but there is not an oxygen level that effectively balances pellicle perforation and cleaning against the onset of photochemical darkening. Neither moisture level nor 172-nm UV lamp pre-cleaning were found to have a significant impact on pellicle lifetime.

Paper Details

Date Published: 30 July 2002
PDF: 10 pages
Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474604
Show Author Affiliations
Andrew Grenville, Intel Corp. (United States)
International SEMATECH (United States)
Vladimir Liberman, MIT Lincoln Lab. (United States)
Mordechai Rothschild, MIT Lincoln Lab. (United States)
Jan H. C. Sedlacek, MIT Lincoln Lab. (United States)
Roger H. French, DuPont Photomasks, Inc. (United States)
Robert C. Wheland, DuPont Central Research (United States)
Xun Zhang, DuPont Photomasks, Inc. (United States)
Joe Gordan, DuPont Photomasks, Inc. (United States)

Published in SPIE Proceedings Vol. 4691:
Optical Microlithography XV
Anthony Yen, Editor(s)

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