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Proceedings Paper

Evaluation of OPC mask printing with a raster scan pattern generator
Author(s): Thomas H. Newman; Jan M. Chabala; B.J. Marleau; Frederick Raymond III; Olivier Toublan; Mark A. Gesley; Frank E. Abboud
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Paper Abstract

MEBESR 50 kV mask pattern generators use Raster GraybeamTM writing, providing an effective grid that is 32X finer than the print grid. The electron beam size and print pixel size are variable between 60 nm and 120 nm, allowing a tradeoff between resolution and write time. Raster scan printing optimizes throughput by transferring precisely the amount of data to the mask that is consistent with the chosen resolution. As with other raster output devices, mask write times are not affected by pattern complexity. This paper examines the theoretical performance of Raster Graybeam for model-based optical proximity correction (OPC) patterns and provides examples of mask patterning performance. A simulation tool is used to model the MEBES eXaraTM system writing strategy, which uses four writing passes, interstitial print grids, offset scans, and eight dose levels per pass. It is found that Raster Graybeam produces aerial image quality equivalent to the convolution of the input pattern data with a Gaussian point spread function. Resolution of 90 nm is achieved for equal lines and spaces, supporting subresolution assist features. Angled features are a particular strength of raster scan patterning, with feature quality and write time that are independent of feature orientation.

Paper Details

Date Published: 30 July 2002
PDF: 11 pages
Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474514
Show Author Affiliations
Thomas H. Newman, Etec Systems, Inc. (United States)
Jan M. Chabala, Etec Systems, Inc. (United States)
B.J. Marleau, Etec Systems, Inc. (United States)
Frederick Raymond III, Etec Systems, Inc. (United States)
Olivier Toublan, Mentor Graphics Corp. (France)
Mark A. Gesley, Etec Systems, Inc. (United States)
Frank E. Abboud, Etec Systems, Inc. (United States)

Published in SPIE Proceedings Vol. 4691:
Optical Microlithography XV
Anthony Yen, Editor(s)

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