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Proceedings Paper

Trace metal removal from microlithography process chemicals: Part I. photoresist solvents
Author(s): Hsiao-Show Mike Tseng; Xiaoping Ling
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Paper Abstract

A novel filtration technique was developed and implemented to study the effect of CUNO Zeta Plus filtration on metal removal from a number of photoresist chemical systems. To obtain consistent metal removal performance, it was found that it was necessary to remove extraneous contaminants from the filtration system prior to actual filtration. A rinse-up protocol was developed and followed for the filtration system and filter medium. The EC and 40Q grades of Zeta Plus were employed in single stage as well as serial multi-stage filtration to remove metal ions from a wide range of microlithography process chemicals. The metal concentration was determined by Atomic Absorption Spectrometry for the influent and effluent samples before and after Zeta Plus filtration. The results showed 90% or greater reduction of the metal levels after single pass filtration. Three photoresist solvents were selected as examples to demonstrate the metal removal performance of Zeta Plus filtration.

Paper Details

Date Published: 24 July 2002
PDF: 8 pages
Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); doi: 10.1117/12.474283
Show Author Affiliations
Hsiao-Show Mike Tseng, CUNO Inc. (United States)
Xiaoping Ling, Clariant Corp. (United States)

Published in SPIE Proceedings Vol. 4690:
Advances in Resist Technology and Processing XIX
Theodore H. Fedynyshyn, Editor(s)

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