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Proceedings Paper

Tandem type resin for chemically amplified KrF positive resist
Author(s): Yasunori Uetani; Masumi Suetsugu; Koichiro Ochiai; Airi Yamada; Ryotaro Hanawa; Nobuo Ando
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Paper Abstract

A mixture of high Mw fractionated novolac resin and 2EAdMA (2-ethyl-2-adamantyle methacrylate)/HST (hydroxy styrene) copolymer brought about high resolution almost comparative to simple 2EAdMA/HST copolymer. Dry etching resistance was higher than 2EAdMA/HST copolymer. A mixture of unfractionated novolac resin and 2EAdMA/HST copolymer showed low resolution. Discrimination curve was measured by DRM on each case. Dissolution contrast of fractionated mixture was almost same as unfractionated one. Dissolution characteristics cannot tell the difference of resolution between fractionated and unfractionated novolac mixture.

Paper Details

Date Published: 24 July 2002
PDF: 8 pages
Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); doi: 10.1117/12.474264
Show Author Affiliations
Yasunori Uetani, Sumitomo Chemical Co., Ltd. (Japan)
Masumi Suetsugu, Sumitomo Chemical Co., Ltd. (Japan)
Koichiro Ochiai, Sumitomo Chemical Co., Ltd. (Japan)
Airi Yamada, Sumitomo Chemical Co., Ltd. (Japan)
Ryotaro Hanawa, Sumitomo Chemical Co., Ltd. (Japan)
Nobuo Ando, Sumitomo Chemical Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 4690:
Advances in Resist Technology and Processing XIX
Theodore H. Fedynyshyn, Editor(s)

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