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Proceedings Paper

Perflourosulfonyl imides and methides: investigating the lithographic potential of novel superacid PAGs
Author(s): DongKwan Lee; Xiaoming Ma; William M. Lamanna; Georg Pawlowski
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Paper Abstract

The lithographic performance of a new class of onium type photo acid generators (PAGs) developed by 3M Company has been evaluated using standard hybrid/acetal and ESCAP type DUV (248 nm) photoresist formulations. The new PAGs produce perfluoroalkyl sulfonylimides or sulfonylmethides with superacidic properties matching or exceeding the acid strength of commonly known perfluoroalkyl sulfonic acids, such as trifluoromethane sulfonic acid. The direct comparison of near commercial photoresist formulations containing onium perfluoroalkyl sulfonates with identical materials using equimolar amounts of the new PAGs revealed that the new 3M PAGs give rise to almost identical lithographic properties, such as resolution, DOF, and exposure latitude. In addition, secondary properties such as photoresist stability, delay stability, or line edge roughness are almost equivalent, and thus the new PAGs are considered as suitable candidates used for the manufacturing of high volume production photoresists.

Paper Details

Date Published: 24 July 2002
PDF: 9 pages
Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); doi: 10.1117/12.474216
Show Author Affiliations
DongKwan Lee, Clariant Japan KK (Japan)
Xiaoming Ma, Clariant Japan KK (Japan)
William M. Lamanna, 3M Co. (United States)
Georg Pawlowski, Clariant Corp. (United States)

Published in SPIE Proceedings Vol. 4690:
Advances in Resist Technology and Processing XIX
Theodore H. Fedynyshyn, Editor(s)

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