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Proceedings Paper

Spherical pinch x-ray generator prototype for microlithography
Author(s): Kenji Kawai; Emilio Panarella; D. Mostacci
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Paper Abstract

A new type of plasma x-ray source has been developed by applying the spherical pinch concept of imploding shock waves to produce a dense plasma hot enough to emit soft x-rays. Very intense x-rays in a few keV energy (5-10 angstroms) is radiated from a small plasma volume as microsecond pulses. SPX II is a prototype machine designed to demonstrate the engineering feasibility of the spherical pinch scheme. It is expected to generate at least 10 mJ/cm2 of usable soft x-rays for microlithography.

Paper Details

Date Published: 1 August 1991
PDF: 7 pages
Proc. SPIE 1465, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing, (1 August 1991); doi: 10.1117/12.47366
Show Author Affiliations
Kenji Kawai, Advanced Laser and Fusion Technology, Inc. (Canada)
Emilio Panarella, Advanced Laser and Fusion Technology, Inc. (Canada)
D. Mostacci, Advanced Laser and Fusion Technology, Inc. (Canada)


Published in SPIE Proceedings Vol. 1465:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing
Martin C. Peckerar, Editor(s)

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