
Proceedings Paper
Development and validation of digital microholo interferometric system for micromechanical testingFormat | Member Price | Non-Member Price |
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Paper Abstract
The development of a digital micro-holo interferometric system is presented in this paper. With respect to the specific requirements on the microscopic scheme in micromeasurement, application of long distance microscope is introduced with emphasis. With its corporation, the achievable microscopic resolution is studied and demonstrated by the use of the standard resolution test target. Experiments are performed to testify the capacity of the proposed system in resolving structures with lateral dimensions at the micro level. A critical issue, validation of the developed system is also addressed. Aided by finite element analysis and analytical calculation, experimental measurement with the system is addressed. Aided by finite element analysis and analytical calculation, experimental measurement with the system is examined using a hybrid approach. To evaluate the performance of the system, microbeam experiment is presented. Results measured with the system, as well as the numerical simulations are obtained. Quantitative comparisons are carried out in terms of load-induced variations of the test sample, based on which the conclusions are given.
Paper Details
Date Published: 19 June 2002
PDF: 10 pages
Proc. SPIE 4778, Interferometry XI: Applications, (19 June 2002); doi: 10.1117/12.473541
Published in SPIE Proceedings Vol. 4778:
Interferometry XI: Applications
Wolfgang Osten, Editor(s)
PDF: 10 pages
Proc. SPIE 4778, Interferometry XI: Applications, (19 June 2002); doi: 10.1117/12.473541
Show Author Affiliations
Lei Xu, Nanyang Technological Univ. (United States)
Xiaoyuan Peng, Nanyang Technological Univ. (United States)
Xiaoyuan Peng, Nanyang Technological Univ. (United States)
Jianmin Miao, Nanyang Technological Univ. (Singapore)
Anand Krishna Asundi, Nanyang Technological Univ. (Singapore)
Anand Krishna Asundi, Nanyang Technological Univ. (Singapore)
Published in SPIE Proceedings Vol. 4778:
Interferometry XI: Applications
Wolfgang Osten, Editor(s)
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