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Proceedings Paper

Alternative approach for direct APC using scatterometry data
Author(s): Boaz Brill; Yoel Cohen; Igor Turovets; Dario Elyasy; Tzevi Beatus
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Paper Abstract

Scatterometry is a promising method, capable of providing accurate profile information for a large range of applications. However, applying scatterometry to the production environment and applying it to APC is still difficult. In this paper we propose an alternative approach in which we apply a Neural Network to directly correlate scatterometry raw data and the lithography process control parameters. The proposed method is much easier to use than normal scatterometry, and can therefore be applied to APC much faster.

Paper Details

Date Published: 16 July 2002
PDF: 4 pages
Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); doi: 10.1117/12.473521
Show Author Affiliations
Boaz Brill, Nova Measuring Instruments, Ltd. (Israel)
Yoel Cohen, Nova Measuring Instruments, Ltd. (Israel)
Igor Turovets, Nova Measuring Instruments, Ltd. (Israel)
Dario Elyasy, Nova Measuring Instruments, Ltd. (Israel)
Tzevi Beatus, Nova Measuring Instruments, Ltd. (Israel)

Published in SPIE Proceedings Vol. 4689:
Metrology, Inspection, and Process Control for Microlithography XVI
Daniel J. C. Herr, Editor(s)

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