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Proceedings Paper

Rotating compensator spectroscopic ellipsometry for line-width control
Author(s): Ha-Young Lee; Kyoung-Yoon Bang; Jaeho Lee; Heungin Bak; Young-Soo Sohn; Ilsin An
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Paper Abstract

Rotating compensator spectroscopic ellipsometry (RCSE) was applied to the characterization of line-width in deep UV photoresist films. Variation of line-width in few nm was distinguishable by comparing the features in conventional ellipsometry parameters or the degree of polarization spectra obtainable form RCSE. The variations in the former spectra were caused by the density change in patterned PR films. Meanwhile, the variations in latter spectra wee caused by the surface profile of the film. Once the spectral positions of the features were related to the result of CD- SEM, both spectra could be used to estimate the line-width of patterned PR without in-depth analysis. Further, when uniaxial anisotropy was assumed for the film, the line-width could be roughly deduced in the process of extracting the optical properties of film via an effective medium approximation.

Paper Details

Date Published: 16 July 2002
PDF: 8 pages
Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); doi: 10.1117/12.473509
Show Author Affiliations
Ha-Young Lee, Hanyang Univ. (South Korea)
Kyoung-Yoon Bang, Hanyang Univ. (South Korea)
Jaeho Lee, Hanyang Univ. (South Korea)
Heungin Bak, Hanyang Univ. (South Korea)
Young-Soo Sohn, Hanyang Univ. (South Korea)
Ilsin An, Hanyang Univ. (South Korea)

Published in SPIE Proceedings Vol. 4689:
Metrology, Inspection, and Process Control for Microlithography XVI
Daniel J. C. Herr, Editor(s)

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