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Proceedings Paper

Simulation of imaging in projection microscope using multi-beam probe
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Paper Abstract

We show simulation images of projection microscope, which uses parallel beam to the sample, detecting secondary electrons, photoelectrons and mirror electrons using electrons and UV/X-ray sources as probe beam. The results show we can see image for square and dense line patterns without charging and damage in the objects. This research can be used for quantitative analysis for projection microscope using multi beam source to get comprehensive information of many characteristics of objects as well as topographic information.

Paper Details

Date Published: 16 July 2002
PDF: 11 pages
Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); doi: 10.1117/12.473497
Show Author Affiliations
Yeong-Uk Ko, Univ. of Tennessee/Knoxville (United States)
David C. Joy, Univ. of Tennessee/Knoxville and Oak Ridge National Lab. (United States)

Published in SPIE Proceedings Vol. 4689:
Metrology, Inspection, and Process Control for Microlithography XVI
Daniel J. C. Herr, Editor(s)

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