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Proceedings Paper

Atomic force microscopy for phase metrology of alternating-aperture phase-shift masks
Author(s): Kirk Miller; Bradley Todd; Tim Pinkerton
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Paper Abstract

With the advent of alternating aperture phase shift masks it has become necessary to Monitor quartz etch depth to ensure quality mask fabrication. To date, optical tools have been primarily used for the phase metrology of these masks. Optical tools have the advantage of using actinic light, but they also have several limitations, most notably: restrictions on the minimum aperture size to be measured, prior knowledge of which aperture is etched and alack of automation. Atomic force microscopes have a long history of depth metrology and the current tip technology is small enough to extend for the next four reticle generations while new tips are being developed to meet semiconductor device roadmaps. We examine several practical issues of using an AFM based system for the phase metrology of APSM masks; matching of AFM to optical tools automation of phase measurement and an examination of the theoretical difference between AFM and optical measurements.

Paper Details

Date Published: 16 July 2002
PDF: 7 pages
Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); doi: 10.1117/12.473484
Show Author Affiliations
Kirk Miller, Veeco Metrology Group (United States)
Bradley Todd, Veeco Metrology Group (United States)
Tim Pinkerton, Intel Corp. (United States)

Published in SPIE Proceedings Vol. 4689:
Metrology, Inspection, and Process Control for Microlithography XVI
Daniel J. C. Herr, Editor(s)

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