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Proceedings Paper

Evaluating the resolution of a CD-SEM
Author(s): Ira J. Rosenberg
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Paper Abstract

Traditionally, CD-SEM resolution has been measured using edge and spacing measurements, where images are subjectively examined and evaluated as to edge transition width between arbitrary amplitudes or minimum measurable spacings between particles. Occasionally, methods form traditional optics, i.e., application of the Rayleigh criterion, have been quoted, but the more conservative results have caused users either to relax these traditional definitions or to abandon them altogether. More recently, as in light optics, Fourier methods, where frequency space results are used to define the resolution of the system, have been applied. In this paper, these methods are surveyed and applied to experimental data. In particular, Fourier transform approaches are examined, and the difficulties in their application vis-a-vis separation signal from noise, maintaining repeatability, and eliminating system and processing artifacts addressed. A method based on the Rayleigh criterion for diffraction limited systems is proposed that minimizes these difficulties by processing out system effects and distancing the evaluation region form both the noise and system artifacts. This method has the particular advantage of not requiring operator intervention, ensuring consistent results form user to user.

Paper Details

Date Published: 16 July 2002
PDF: 11 pages
Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); doi: 10.1117/12.473472
Show Author Affiliations
Ira J. Rosenberg, Schlumberger Semiconductor Solutions (United States)

Published in SPIE Proceedings Vol. 4689:
Metrology, Inspection, and Process Control for Microlithography XVI
Daniel J. C. Herr, Editor(s)

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