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Proceedings Paper

Overlay metrology simulations
Author(s): Joel L. Seligson; Michael Friedmann; Boris Golovanevsky; Vladimir Levinsky
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Paper Abstract

In order to control and minimize overlay metrology errors, we have to deal with a number of design parameters both in the metrology tool domain and in the overlay target domain. For enhancing the rate of performance improvement vs. technology investment, simulation can be used for modeling both the effects of overlay metrology tool behavior and the impact of target designs on the ultimate metrology performance.

Paper Details

Date Published: 16 July 2002
PDF: 9 pages
Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); doi: 10.1117/12.473469
Show Author Affiliations
Joel L. Seligson, KLA-Tencor Corp. (Israel)
Michael Friedmann, KLA-Tencor Corp. (Israel)
Boris Golovanevsky, KLA-Tencor Corp. (Israel)
Vladimir Levinsky, KLA-Tencor Corp. (Israel)

Published in SPIE Proceedings Vol. 4689:
Metrology, Inspection, and Process Control for Microlithography XVI
Daniel J. C. Herr, Editor(s)

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