Nanometrology LLC has developed a unique set of solutions for optimizing CD-SEM metrology by improving signal to noise ratio and quantifying scan non-linearity. Examples of Nanometrology's solutions for improved CD-SEM magnification calibration are demonstrated using CD-SEMs from a variety of user sites. To our knowledge, this is the first time that a method to quantify CD-SEM scan non-linearity with precision 0.1 percent has been reported. Calibration precision of 0.1 percent or better can be achieved on both cross-section and CD-SEMs to enable them to meet or exceed the requirements of the ITRS roadmap beyond 2014.

Date Published: 16 July 2002
PDF: 11 pages
Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); doi: 10.1117/12.473447

Published in SPIE Proceedings Vol. 4689:
Metrology, Inspection, and Process Control for Microlithography XVI
Daniel J. C. Herr, Editor(s)