Proceedings Paper
Matching and monitoring a CD-SEM tool cluster| Format | Member Price | Non-Member Price |
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Paper Abstract
Nanometrology's unique solution to CD-SEM magnification calibration and matching. This utilizes a novel magnification calibration reference material (MCRM) designed and fabricated on an 8 inch wafer. When used with the proprietary software, it allows one to calibrate and match individual CD-SEMs. CD-SEM behavior can now be quantified in terms of its parameters such as the average magnification in the field of view (FOV), magnification non-linearity and magnification stability. It is essential to quantify these parameters with a precision of 0.1 percent or better in order to meet requirements for sub-100nm metrology.
Paper Details
Date Published: 16 July 2002
PDF: 8 pages
Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); doi: 10.1117/12.473446
Published in SPIE Proceedings Vol. 4689:
Metrology, Inspection, and Process Control for Microlithography XVI
Daniel J. C. Herr, Editor(s)
PDF: 8 pages
Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); doi: 10.1117/12.473446
Show Author Affiliations
Albert Sicignano, Nanometrology LLC (United States)
Arkady V. Nikitin, Nanometrology LLC (United States)
Dmitriy Y. Yeremin, Nanometrology LLC (United States)
Arkady V. Nikitin, Nanometrology LLC (United States)
Dmitriy Y. Yeremin, Nanometrology LLC (United States)
Published in SPIE Proceedings Vol. 4689:
Metrology, Inspection, and Process Control for Microlithography XVI
Daniel J. C. Herr, Editor(s)
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