Share Email Print

Proceedings Paper

Characterization and control of organic airborne contamination in lithographic processing
Author(s): Andrew J. Dallas; Kristine M. Graham; Marc Clarysse; Vic Fonderle
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

In the DUV lithographic process, airborne contamination, such as ammonia and 1-methyl-2-pyrrolidinone, is known to present several processing problems. Presently, these airborne contaminants are effectively controlled using either acid-base or ion-exchange chemistry. However, as lithographic processing moves towards the creation of smaller features using 193 nm and 157 nm technologies, airborne and condensable organic contamination presents an ever-increasing concern. In addition, the wide range of chemical and physical properties of the organic contaminants found in the processing environment, do not lend themselves to effective control using the specific chemisorptive techniques currently applied. In conjunction with our efforts to design improved chemical filters for the effective control of organic airborne contaminants, we have attempted to characterize the organic airborne contamination found in the lithographic processing environment. In addition, we have evaluated the effectiveness of activated carbon filters for their removal. In this report, we will present our current findings and reveal some of the benefits and concerns associated with the use of activated carbon-based chemical filters for the control of organic airborne contamination in present and future processing applications.

Paper Details

Date Published: 16 July 2002
PDF: 25 pages
Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); doi: 10.1117/12.473438
Show Author Affiliations
Andrew J. Dallas, Donaldson Co., Inc. (United States)
Kristine M. Graham, Donaldson Co., Inc. (United States)
Marc Clarysse, IMEC (Belgium)
Vic Fonderle, IMEC (Belgium)

Published in SPIE Proceedings Vol. 4689:
Metrology, Inspection, and Process Control for Microlithography XVI
Daniel J. C. Herr, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?