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Proceedings Paper

Development of a dual-probe Caliper CD-AFM for near model-independent nanometrology
Author(s): Vladimir Mancevski; Paul F. McClure
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Paper Abstract

A Caliper CD-AFM under development at Xidex uses dual atomic force microscope (AFM) probes that operate together as a caliper for accessing vertical and highly reentrant sidewalls of high aspect-ratio features. This virtually eliminates the ubiquitous effect of probe width, which has been a large component of uncertainty in optical, scanning electron microscope (SEM), and scanning probe microscopy (SPM) linewidth measurements for decades. The resulting tool architecture eliminates the main model-dependent uncertainties associated with nanometer-scale length measurements. By drastically reducing the magnitude, complexity, and variability of model dependence, the tool is made more robust and easier to calibrate. We have already demonstrated the functionality of a single tilted probe. Future developments include dual tilted probes that scan in coordinated fashion.

Paper Details

Date Published: 16 July 2002
PDF: 9 pages
Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); doi: 10.1117/12.473418
Show Author Affiliations
Vladimir Mancevski, Xidex Corp. (United States)
Paul F. McClure, Xidex Corp. (United States)

Published in SPIE Proceedings Vol. 4689:
Metrology, Inspection, and Process Control for Microlithography XVI
Daniel J. C. Herr, Editor(s)

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