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Proceedings Paper

Growth mechanism of orientated PLZT thin films sputtered on glass substrate
Author(s): Rui Tao Zhang; Ming Ge; Weigen Luo
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Paper Abstract

Closely packed polycrystalline transparent PLZT(28/0/100) thin films with excellent crystal orientation have been successfully prepared on glass substrate by rf planar magnetron sputtering using powder target. The preferred orientation of PLZT(28/0/100) thin film is (100). Its growth mechanism can be described by Volmer-Weber Mechanism. At the incipience of sputtering, preferred orientated PLZT small islands are formed on glass. Then through the coalescence of these islands and recrystallization process, the polycrystalline orientated PLZT thin film is formed. In proper sputtering conditions, PLZT thin films with single orientation can be prepared.

Paper Details

Date Published: 1 November 1991
PDF: 4 pages
Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); doi: 10.1117/12.47227
Show Author Affiliations
Rui Tao Zhang, Shanghai Institute of Ceramics (China)
Ming Ge, Shanghai Institute of Ceramics (China)
Weigen Luo, Shanghai Institute of Ceramics (China)

Published in SPIE Proceedings Vol. 1519:
International Conference on Thin Film Physics and Applications
Shixun Zhou; Yongling Wang, Editor(s)

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