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Proceedings Paper

Fully automated interference lithography
Author(s): Bruce D. McLeod; Adam F. Kelsey; Mark A. Leclerc; Daniel P. Resler; Sergey Liberman; James P. Nole
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Paper Abstract

Interferometric Lithography has long been considered a viable means to achieve sub-micron resolution lithography over large areas without the use of traditional photomasks. However, traditional IL configurations set up in laboratories on optical isolation tables requires sophisticated optical designs and are greatly limited in both throughput and yield due to these complexities and manual configurations. The Microphotonics Group at OSC has introduced a series of fully automated interference lithography based tool systems that can achieve resolution down to 190 nm period and address a multitude of applications requiring sub-micron resolution in a high- throughput, stabile, manufacturing environment.

Paper Details

Date Published: 1 July 2002
PDF: 12 pages
Proc. SPIE 4688, Emerging Lithographic Technologies VI, (1 July 2002); doi: 10.1117/12.472277
Show Author Affiliations
Bruce D. McLeod, Optical Switch Corp. (United States)
Adam F. Kelsey, Optical Switch Corp. (United States)
Mark A. Leclerc, Optical Switch Corp. (United States)
Daniel P. Resler, Optical Switch Corp. (United States)
Sergey Liberman, Optical Switch Corp. (United States)
James P. Nole, Optical Switch Corp. (United States)

Published in SPIE Proceedings Vol. 4688:
Emerging Lithographic Technologies VI
Roxann L. Engelstad, Editor(s)

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