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Proceedings Paper

Laser radiometry for UV lasers at 193 nm
Author(s): Stefan Kueck; Klaus Liegmann; Klaus Moestl; Friedhelm Brandt; Juergen Metzdorf
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Paper Abstract

A setup for the measurement and calibration of laser power at the excimer laser wavelength of 193 nm was realized. The investigations include the measurements of the damage threshold and the determination of the effective spectral reflectance of the material used for the standard detector, named LM4. The results of these studies allow the complete characterization of the LM4 standard detector including an uncertainty analysis according to the "Guide to the Expression of Uncertainty in Measurement." The LM4 standard detector is linked to the calibration chain established at the Physikalisch-Technische Bundesanstalt (PTB), the German National Metrology Institute. Furthermore, two transfer detectors were linked to the LM4 at the wavelength of 193 nm. Calibrations can be performed down to 193 nm with a relative expanded uncertainty (k = 2) below 1.6 %. Maximum average power, for which calibrations can be performed, is 2.8 W at a repetition rate of 200 Hz. An outlook for the calibration of the laser power at 157 nm is given.

Paper Details

Date Published: 30 May 2003
PDF: 11 pages
Proc. SPIE 4932, Laser-Induced Damage in Optical Materials: 2002 and 7th International Workshop on Laser Beam and Optics Characterization, (30 May 2003);
Show Author Affiliations
Stefan Kueck, Physikalisch-Technische Bundesanstalt (Germany)
Klaus Liegmann, Physikalisch-Technische Bundesanstalt (Germany)
Klaus Moestl, Physikalisch-Technische Bundesanstalt (Germany)
Friedhelm Brandt, Physikalisch-Technische Bundesanstalt (Germany)
Juergen Metzdorf, Physikalisch-Technische Bundesanstalt (Germany)

Published in SPIE Proceedings Vol. 4932:
Laser-Induced Damage in Optical Materials: 2002 and 7th International Workshop on Laser Beam and Optics Characterization
Gregory J. Exarhos; Adolf Giesen; Arthur H. Guenther; Norbert Kaiser; Keith L. Lewis; Horst Weber; M. J. Soileau; Christopher J. Stolz, Editor(s)

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