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Proceedings Paper

Fabrication and characterization of c-axis-oriented transparent conductive nanocrystalline AZO thin films by rf magnetron sputtering
Author(s): Guojia Fang; Dejie Li; Bao-Lun Yao
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Paper Abstract

Using high density ZnO:Al2O3 (AZO) target (94%) and without introducing any reaction oxygen, (001)-oriented transparent conductive AZO thin films are prepared by rf planar magnetron sputtering deposition on soda-lime glass. The structural, electrical and optical properties of the films deposited and annealed at different conditions are characterized with various techniques. The as-deposited and post-deposition annealed thin films have highly c-axis-orientated growth with hexagonal structure. Samples deposited at below 360°C are very smooth with spherical grains about tens nano-meters, the crystallization has been improved with vacuum annealing. The experimental results show that AZO thin films with optical transmittance of above 85% at wavelength of 550 nm and electrical resistivity of 10-4 Ωcm order were achieved by deposition at substrate temperature of 360°C and subsequently annealed at 450°C for 2 h in vacuum pressure of 10-5 Torr. With increase of the deposition temperature or post-deposition annealing in vacuum, the carrier concentration of AZO thin film increases, and the absorption edge in transmission spectra shifts toward the shorter wavelength side (blue shift).

Paper Details

Date Published: 20 September 2002
PDF: 7 pages
Proc. SPIE 4919, Advanced Materials and Devices for Sensing and Imaging, (20 September 2002); doi: 10.1117/12.471878
Show Author Affiliations
Guojia Fang, Tsinghua Univ. and Xiangfan Univ. (China)
Dejie Li, Tsinghua Univ. (China)
Bao-Lun Yao, Tsinghua Univ. (China)

Published in SPIE Proceedings Vol. 4919:
Advanced Materials and Devices for Sensing and Imaging
Jianquan Yao; Yukihiro Ishii, Editor(s)

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