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Proceedings Paper

Effective distributed architecture for OPC and RET applications
Author(s): Robert M. Lugg; Mathias Boman; James Burdorf; Michael L. Rieger
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Paper Abstract

The computational power needed to generate mask layouts for OPC and resolution enhancement techniques increases exponentially with process node. Rapidly growing design complexity is compounded with the more aggressive methods now required for smaller feature sizes. Layers once considered non-critical now routinely receive correction. While some improvement in code efficiency can be expected, algorithms are maturing to the point where improvements will likely not keep pace with the computational need. To maintain required processing cycle times massively parallel processing methods must be employed. In this paper we discuss loosely-coupled distributed computing architectures applied to OPC/RET layout synthesis. The degree to which an application is scalable depends on how well the problem can be divided into independent sets of data. Furthermore, data must also be partitioned into reasonably sized blocks so that memory requirements per processor can be bounded. Communication overhead, I/O overhead and serial processeses all degrade scalability, and may increase overall storage requirements. In this paper we analyze behavior of distributed processing architectures with large numbers of processors, and we present performance data on an existing massively parallel system.

Paper Details

Date Published: 27 December 2002
PDF: 6 pages
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); doi: 10.1117/12.471300
Show Author Affiliations
Robert M. Lugg, Synopsys, Inc. (United States)
Mathias Boman, Synopsys, Inc. (United States)
James Burdorf, Synopsys, Inc. (United States)
Michael L. Rieger, Synopsys, Inc. (United States)

Published in SPIE Proceedings Vol. 4889:
22nd Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Kurt R. Kimmel, Editor(s)

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