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Proceedings Paper

Effects of laser parameters on plume characteristics and ablation rate
Author(s): Zongli Li; Sohzeom Yow; Lena Lui; Nikolai Leopoldovich Yakovlev; Peter M. Moran
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Paper Abstract

Laser ablation of polyimide and polycarbonate by 3rd harmonic Nd-YAG laser is studied using secondary ion mass spectrometry (SIMS) and confocal microcopy. The ablated debris' were collected on an H-terminated Si substrate and then analyzed using SIMS. Mass resolved images of collected debris showed near-hemispherical distribution of hydrocarbon, nitrogen containing compounds with radius up to 0.7 mm. Ablation in different gases revealed that the nitrogen and oxygen containing compounds are formed because of a reaction of the hot plume with air in the course of thermal dissociation of O2 and oxygen-assisted dissociation of N2. The shape and size of the microvia were measured using confocal microscopy through a polished edge of the polymer target. The via drilled in pulse-by- pulse ablation (PBPA) was found to be deeper than that drilled in continuous ablation (CA) with the same number of pulses. This is due to shading of the laser light by the plume from the preceding pulse. In result, explosive boiling occurs during PBPA, while normal vaporization dominates during CA. Several mechanisms of etching of side walls are discussed.

Paper Details

Date Published: 18 June 2002
PDF: 11 pages
Proc. SPIE 4637, Photon Processing in Microelectronics and Photonics, (18 June 2002); doi: 10.1117/12.470649
Show Author Affiliations
Zongli Li, Institute of Materials Research & Engineering (Singapore)
Sohzeom Yow, Institute of Materials Research & Engineering (Singapore)
Lena Lui, National Univ. of Singapore (Singapore)
Nikolai Leopoldovich Yakovlev, Institute of Materials Research & Engineering (Singapore)
Peter M. Moran, Institute of Materials Research & Engineering (Singapore)

Published in SPIE Proceedings Vol. 4637:
Photon Processing in Microelectronics and Photonics
Jan J. Dubowski; Koji Sugioka; Malcolm C. Gower; Willem Hoving; Richard F. Haglund Jr.; Alberto Pique; Frank Traeger; Jan J. Dubowski; Willem Hoving, Editor(s)

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