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Proceedings Paper

Background gas effects on structural properties in thin films deposited by pulsed laser deposition
Author(s): Yuka Yamada; Nobuyasu Suzuki; Toshiharu Makino; Takehito Yoshida
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Paper Abstract

Pulsed laser deposition (PLD) in background gases is a promising method of preparing multicomponent functional thin films, because interactions between the ablated species and the background gases promote not only physical collisions but also chemical reactions, and affect the characteristics of the deposited films. The properties of indium oxide (In2O3) thin films prepared by PLD in background gases were characterized in relation to the background gas pressures. Transparent crystalline In2O3 thin films could be obtained at background gas pressures above 1.0 Torr on unheated glass substrates. This result can be accounted for by the background gas effects. The stoichiometric In2O3 nuclei should be formed in the nonequilibrium high-pressure and high-temperature region generated by the shock front excited by the pulsed laser. Microstructures of the deposited thin films were also investigated using a cross-sectional transmission electron microscope. Initially, amorphous-like layers with a thickness of about 50 nm were formed on the substrates. Subsequently, strongly textured crystalline columns grew on the amorphous-like layers. We discuss the mechanism of thin film growth in PLD.

Paper Details

Date Published: 18 June 2002
PDF: 8 pages
Proc. SPIE 4637, Photon Processing in Microelectronics and Photonics, (18 June 2002); doi: 10.1117/12.470613
Show Author Affiliations
Yuka Yamada, Matsushita Electric Industrial Co., Ltd. (Japan)
Nobuyasu Suzuki, Matsushita Electric Industrial Co., Ltd. (Japan)
Toshiharu Makino, Matsushita Electric Industrial Co., Ltd. (Japan)
Takehito Yoshida, Matsushita Electric Industrial Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 4637:
Photon Processing in Microelectronics and Photonics
Jan J. Dubowski; Koji Sugioka; Malcolm C. Gower; Willem Hoving; Richard F. Haglund Jr.; Alberto Pique; Frank Traeger; Jan J. Dubowski; Willem Hoving, Editor(s)

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