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Proceedings Paper

Light-induced polishing of evaporating surface
Author(s): Vladimir N. Tokarev; Vitali I. Konov
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Paper Abstract

A theoretical model of surface polishing of materials evaporating by light from solid phase is proposed. On the basis of the model, an explanation is given for the experimentally observed phenomenon of diamond films surface polishing as a result of their graphitization and vaporization from solid phase under the action of multipulse radiation of an excimer XeCl laser. The proposed model of surface polishing by light can also be applied for the case of thermochemical etching by radiation where the rate of etching also has Arrhenius dependence on surface temperature. This new technique has promising possibilities in the processing of hard and superhard materials.

Paper Details

Date Published: 1 September 1991
PDF: 10 pages
Proc. SPIE 1503, Excimer Lasers and Applications III, (1 September 1991); doi: 10.1117/12.46939
Show Author Affiliations
Vladimir N. Tokarev, General Physics Institute (Russia)
Vitali I. Konov, General Physics Institute (Russia)

Published in SPIE Proceedings Vol. 1503:
Excimer Lasers and Applications III
Tommaso Letardi; Lucien Diego Laude, Editor(s)

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