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Proceedings Paper

Laser micromachining of optical materials with a 157-nm fluorine laser
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Paper Abstract

Vacuum UV laser micromachining is used to produce microstructures in common photonics materials. The ablation etch rates of lithium niobate, fused silica and indium phosphide are measured at 157nm and angled facets and v-grooves are machined into the materials using a high NA mask projection system. The applicability of such micromachined structures for photonics devices is discussed and future developments outlined.

Paper Details

Date Published: 15 April 2003
PDF: 7 pages
Proc. SPIE 4941, Laser Micromachining for Optoelectronic Device Fabrication, (15 April 2003); doi: 10.1117/12.468234
Show Author Affiliations
Jako Greuters, Exitech Ltd. (United Kingdom)
Nadeem Hasan Rizvi, Exitech Ltd. (United Kingdom)

Published in SPIE Proceedings Vol. 4941:
Laser Micromachining for Optoelectronic Device Fabrication
Andreas Ostendorf, Editor(s)

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