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Proceedings Paper

Process monitoring of etched fused silica phase-shift reticles
Author(s): Cynthia B. Brooks; Melisa J. Buie; Nabila L. Waheed; Patrick M. Martin; Phillip Walsh; Glenn Evans
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Paper Abstract

Alternating Aperture Phase Shift Masks (AAPSMs) are becoming increasingly important as a reticle enhancement technique (RET) in meeting the key lithography requirements for the ITRS Lithography Roadmap. Fused silica etch depth is the critical parameter that determines the phase shift and must be monitored closely for depth and uniformity. At present the methods that measure phase-shift and etch depth, such as interferometry, profilometry, AFM, and SEM, are expensive, slow, and/or destructive, making alternate techniques attractive for a production environment. This paper will present a novel technique, which utilizes a special type of broadband spectrophotometry, specifically developed for high-throughput, accurate, and non-destructive real-time measurements of trench depth. The measurement takes only three seconds per measured site, so that a full uniformity map can be obtained in two to three minutes. The technique involves simultaneous measurement and mapping of reflectance (R) and transmittance (T) from 190-1000 nm and analysis based on the Forouhi-Bloomer dispersion equations, to efficiently and nondestructively monitor trench depth. This new measurement system exhibits excellent repeatability, correlates very closely with AFM, SEM, as well as direct phase shift measurements, and has been proven to perform very well in production environments. Data will be presented from the user's (Etec Systems, Applied Materials Mask Business Group) viewpoint.

Paper Details

Date Published: 27 December 2002
PDF: 7 pages
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); doi: 10.1117/12.468212
Show Author Affiliations
Cynthia B. Brooks, Etec Systems, Inc., An Applied Materials Co. (United States)
Melisa J. Buie, Etec Systems, Inc., An Applied Materials Co. (United States)
Nabila L. Waheed, Photronics Inc. (United States)
Patrick M. Martin, Photronics Inc. (United States)
Phillip Walsh, n&k Technology, Inc. (United States)
Glenn Evans, n&k Technology, Inc. (United States)

Published in SPIE Proceedings Vol. 4889:
22nd Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Kurt R. Kimmel, Editor(s)

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