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Proceedings Paper

Mask patterning using chemically amplified resists and the novel STEAG HamaTech Blank Coater ASR5000
Author(s): Corinna Koepernik; Dirk Beyer; Peter Dress; Thomas Hoffmann; Peter Hudek; Mathias Irmscher; Christian Krauss; Bernd Leibold; Dietmar Mueller; Christian Reuter; Reinhard Springer; Jakob Szekeresch; Peter Voehringer
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Paper Abstract

The new capillary spin (CAP-Spin) coating principle, realized in the STEAG HamaTech ASR5000, was evaluated for mask making using chemically amplified resists. Basic correlations between coating parameters, resist thickness and film uniformity were figured out. We achieved a film thickness uniformity of close to 2% total range after a process optimization based on our investigation results with the positive tone resist JSR KRS-XE. Finally, the performance of ASR coated blanks was assessed on the basis of a binary mask making process using the Fuji FEP171 resist. The ASR5000 was integrated in an advanced tool set and the patterned reticles have met the requirements of the 100nm Technology Node in terms of resolution and CD-uniformity. No correlation between thickness and CD distribution could be observed. The evaluated post coating and post exposure delay influence of FEP171 also confirms the usability of the ASR5000 coated substrates for advanced mask making.

Paper Details

Date Published: 27 December 2002
PDF: 12 pages
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); doi: 10.1117/12.467424
Show Author Affiliations
Corinna Koepernik, Institut fuer Mikroelektronik Stuttgart Chips (Germany)
Dirk Beyer, Leica Microsystems Lithography GmbH (Germany)
Peter Dress, STEAG HamaTech AG (Germany)
Thomas Hoffmann, Institut fuer Mikroelektronik Stuttgart (Germany)
Peter Hudek, Leica Microsystems Lithography GmbH (Germany)
Mathias Irmscher, Institut fuer Mikroelektronik Stuttgart (Germany)
Christian Krauss, STEAG HamaTech AG (Germany)
Bernd Leibold, Institut fuer Mikroelektronik Stuttgart (Germany)
Dietmar Mueller, Institut fuer Mikroelektronik Stuttgart (Germany)
Christian Reuter, Institut fuer Mikroelektronik Stuttgart (Germany)
Reinhard Springer, Institut fuer Mikroelektronik Stuttgart (Germany)
Jakob Szekeresch, STEAG HamaTech AG (Germany)
Peter Voehringer, Institut fuer Mikroelektronik Stuttgart (Germany)

Published in SPIE Proceedings Vol. 4889:
22nd Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Kurt R. Kimmel, Editor(s)

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