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Proceedings Paper

Synthesis of thin diamond films on Si substrate by the means of near-surface glow discharge CVD
Author(s): Yong Shang; Lifang Dong; Boqin Ma
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Paper Abstract

In this paper, nanocrystalline diamond films had been synthesized by near surface glow discharge chemical vapor deposition on single-crystalline (100) silicon substrates when methane and hydrogen acted as input gases. The characters of the diamond films had been identified by scanning electron microscopy (SEM), Raman Spectrum and X-ray diffraction (XRD). The analytic results show that the high quality nanocrystalline diamond film of (111) orientation had been deposited on single-crystalline (100) silicon substrate at temperature of approximately 850°C. Simultaneously, the studies of the influence of gas pressure and CH4 concentration in feeding gas on the diamond growth were made.

Paper Details

Date Published: 20 September 2002
PDF: 4 pages
Proc. SPIE 4919, Advanced Materials and Devices for Sensing and Imaging, (20 September 2002); doi: 10.1117/12.465648
Show Author Affiliations
Yong Shang, Hebei Univ. and Natural Science Foundation (China)
Lifang Dong, Hebei Univ. (China)
Boqin Ma, Hebei Univ. (China)

Published in SPIE Proceedings Vol. 4919:
Advanced Materials and Devices for Sensing and Imaging
Jianquan Yao; Yukihiro Ishii, Editor(s)

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