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Proceedings Paper

Process control capability using a diaphragm photochemical dispense system
Author(s): Terrell D. Cambria; Scott F. Merrow
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Paper Abstract

This paper describes the methods and equipment which can be used to optimize the photochemical dispense process from a contamination and process control perspective. It describes the impact of point-of-use (POU) filtration on coating quality and gel removal; compares the performance of bellows and diaphragm pump designs for the dispensing of photoresist; and quantifies defect reduction studies using POU filtration of polyimide and spin-on-glass (SOG) photochemicals.

Paper Details

Date Published: 1 June 1991
PDF: 6 pages
Proc. SPIE 1466, Advances in Resist Technology and Processing VIII, (1 June 1991); doi: 10.1117/12.46415
Show Author Affiliations
Terrell D. Cambria, Millipore Corp. (United States)
Scott F. Merrow, Millipore Corp. (United States)

Published in SPIE Proceedings Vol. 1466:
Advances in Resist Technology and Processing VIII
Hiroshi Ito, Editor(s)

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