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Proceedings Paper

Polyvinylphenols protected with tetrahydropyranyl group in chemical amplification positive deep-UV resist systems
Author(s): Nobuaki Hayashi; Leo Schlegel; Takumi Ueno; Hiroshi Shiraishi; Takao Iwayanagi
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Paper Abstract

Tetrahydropyranyl(THP) protected poly(p-vinylphenol)s were synthesized and their acid-catalyzed thermal deprotection has been utilized in the design of alkali developable, positive deep UV resist systems incorporating chemical amplification. Solubility of poly(p- tetrahydropyranyloxystyrene)(THP-M) films mixed with appropriate photoacid-generator (PAG) in alkaline developers increases upon exposure to deep UV radiation and subsequent heating. In a three component application where THP-M and PAG are mixed with a novolak resin, THP-M acts as an acid-labile dissolution inhibitor. Its dissolution inhibition ability was higher than that of a conventional photo-active dissolution inhibitor, diazonaphthoquinone. It is found that simple sulfonic esters such as 1,2,3-tri(methane sulfonyloxy) benzene (MeSB) are superior to onium salts in the three component approach because no negative tone side effect occurs when these esters are used as PAG. Fine patterns of 0.35 micrometers lines and spaces are obtained using KrF excimer laser steppers for the 3-component resists.

Paper Details

Date Published: 1 June 1991
PDF: 7 pages
Proc. SPIE 1466, Advances in Resist Technology and Processing VIII, (1 June 1991); doi: 10.1117/12.46386
Show Author Affiliations
Nobuaki Hayashi, Hitachi Ltd. (Japan)
Leo Schlegel, Hitachi Ltd. (Japan)
Takumi Ueno, Hitachi Ltd. (Japan)
Hiroshi Shiraishi, Hitachi Ltd. (Japan)
Takao Iwayanagi, Hitachi Ltd. (Japan)

Published in SPIE Proceedings Vol. 1466:
Advances in Resist Technology and Processing VIII
Hiroshi Ito, Editor(s)

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